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US 10,012,775 B2Granted
Composite filter for visible light transmission and long wave reflection
AssigneeUniversity of Houston System
InventorsZhifeng Ren, Tianyi Sun, Chuanfei Guo
Life of this patent
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Abstract
Systems and methods disclosed herein are directed towards the fabrication of a nanomesh composite filter (NCF) that can be manufactured according to various embodiments, all of which are intended to be fabricated in order to control the transmission, reflection, and absorption of various wavelengths bands. In particular, the disclosed embodiments may be used for heat shielding applications where certain wavelength ranges may be desirable to transmit and others may be desirable to reflect.
Claims20
A composite filter comprising:
- a dielectric stack, comprising:
- a first dielectric layer and a third dielectric layer of a first composition;
- a second dielectric layer and a fourth dielectric layer of a second composition,
- wherein the first composition is different from the second composition;
- wherein the second dielectric layer is in direct contact with the first dielectric layer and the third dielectric layer, and wherein the third dielectric layer is in direct contact with the second dielectric layer and the fourth dielectric layer;
- and
- a nanomesh structure disposed in direct contact with the first dielectric layer of the dielectric stack, wherein the nanomesh structure comprises a plurality of randomly woven metallic serpentines and a plurality of holes between the serpentines.
4 more elements
A composite filter comprising:
- a dielectric stack, comprising:
- a first dielectric layer and a third dielectric layer of a first composition;
- a second dielectric layer and a fourth dielectric layer of a second composition,
- wherein the first composition is different from the second composition;
- wherein the second dielectric layer is in direct contact with the first dielectric layer and the third dielectric layer, and wherein the third dielectric layer is in direct contact with the second dielectric layer and the fourth dielectric layer, wherein the first composition comprises at least one of TiO2, SiO2, or Al2O3;
- and
- a nanomesh structure disposed in direct contact with the first dielectric layer of the dielectric stack, wherein the nanomesh structure comprises a plurality of randomly woven metallic serpentines and a plurality of holes between the serpentines.
4 more elements
Dependencies are inferred from the claim text.