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US 10,007,184 B2Granted
Silicon-containing underlayers
AssigneeRohm and Haas Electronic Materials LLC
InventorsLi Cui, Charlotte A. Cutler, Suzanne M. Coley, Owendi Ongayi, Christopher P. Sullivan, Paul J. LaBeaume, Shintaro Yamada, Mingqi Li, James F. Cameron
Life of this patent
Estimating the term…
Abstract
Wet-strippable underlayer compositions comprising one or more silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers, and a cure catalyst are provided. These compositions are useful in the manufacture of various electronic devices.
Claims10
A process comprising:
- (a) coating a substrate with a coating composition comprising one or more curable silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers comprising as polymerized units one or more ethylenically unsaturated monomers having an acidic proton and having a pKa in water from −5 to 13, one or more organic solvents, and one or more quaternary ammonium salts as a cure catalyst to form a curable silicon-containing polymer layer on the substrate;
- (b) curing the silicon-containing polymer layer to form a siloxane underlayer, (c) disposing a layer of a photoresist on the siloxane underlayer, (d) pattern-wise exposing the photoresist layer to form a latent image;
- (e) developing the latent image to form a patterned photoresist layer having a relief image therein;
- (f) transferring the relief image to the siloxane underlayer plasma etching;
- and (g) removing the siloxane underlayer by contacting the siloxane underlayer with a wet stripping composition comprising a mixture of sulfuric acid and hydrogen peroxide or a mixture of ammonia and hydrogen peroxide;
- wherein the organic blend polymer comprises as polymerized units one or more monomers of formula (1) and one or more monomers of formula (2)
- wherein Z is an organic residue having from 1 to 30 carbon atoms and an acidic proton having a pKa in water from −5 to 13:
- R20 is chosen from H, C1-10 alkyl, C1-10 haloalkyl, halo, C(═O)R24 and Z;
- each of R21 and R22 are independently chosen from H, C1-4 alkyl, C1-4 haloalkyl, halo, CN and Z;
- R24 is independently chosen from OR25 and N(R26)2;
- R25 is chosen from H, and C1-20 alkyl;
- each R26 is independently chosen from H, C1-20 alkyl, and C6-20 aryl;
- wherein Z and R20 may be taken together to form a 5 to 7-membered unsaturated ring;
- ADG is an acid decomposable group;
- and R1 is independently chosen from H, C1-4 alkyl, C1-4 haloalkyl, halo, and CN.
12 more elements
A process comprising:
- (a) coating a substrate with a coating composition comprising one or more curable silicon-containing polymers comprising a backbone comprising Si—O linkages, one or more organic blend polymers comprising as polymerized units one or more ethylenically unsaturated monomers having an acidic proton and having a pKa in water from −5 to 13, one or more organic solvents, and one or more quaternary ammonium salts as a cure catalyst to form a curable silicon-containing polymer layer on the substrate;
- (b) curing the silicon-containing polymer layer to form a siloxane underlayer, (c) disposing a layer of a photoresist on the siloxane underlayer;
- (d) pattern-wise exposing the photoresist layer to form a latent image;
- (e) developing the latent image to form a patterned photoresist layer having a relief image therein;
- (f) transferring the relief image to the siloxane underlayer by plasma etching;
- and (g) removing the siloxane underlayer by contacting the siloxane underlayer with a wet stripping composition comprising a mixture of sulfuric acid and hydrogen peroxide or a mixture of ammonia and hydrogen peroxide;
- wherein the organic blend polymer comprises as polymerized units one or more monomers of formula (1) and one or more monomers of formula (9)
- wherein Z is an organic residue having from 1 to 30 carbon atoms and an acidic proton having a pKa in water from −5 to 13;
- R20 is chosen from H, C1-10 alkyl, C1-10 haloalkyl, halo, C(═O)R24 and Z;
- each of R21 and R22 are independently chosen from H, C1-4 alkyl, C1-4 haloalkyl, halo, CN and Z;
- R24 is independently chosen from OR2 and N(R26)2;
- R2 is chosen from H, and C1-20 alkyl;
- each R26 is independently chosen from H, C1-20 alkyl, and C1-20 aryl;
- wherein Z and R20 may be taken together to form a 5 to 7-membered unsaturated ring;
- R1 is independently chosen from H, C1-4 alkyl, C1-4 haloalkyl, halo, and CN;
- and R2 is a monovalent organic residue having a lactone moiety.
13 more elements
Dependencies are inferred from the claim text.