Thermal acid generators and photoresist pattern trimming compositions and methods
AssigneeRohm and Haas Electronic Materials LLC
InventorsIrvinder Kaur, Cong Liu, Kevin Rowell, Gerhard Pohlers, Mingqi Li
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Abstract
Provided are ionic thermal acid generators comprising an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group and a cation. Also provided are photoresist pattern trimming compositions that include an ionic thermal acid generator, a matrix polymer and a solvent, and methods of trimming a photoresist pattern using the trimming compositions. The thermal acid generators, compositions and methods find particular applicability in the manufacture of semiconductor devices.
Claims18
An ionic thermal acid generator, comprising:
- an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group, wherein the anion comprises a fluoroalcohol group of the formula —C(CF3)2OH;
- and a cation.
An ionic thermal acid generator, comprising:
- an anion of an aromatic sulfonic acid comprising one or more fluorinated alcohol group, and a cation, wherein the fluorinated alcohol group comprises:
- a fluorine atom bonded to a carbon at the alpha position of the hydroxyl group and/or a fluorinated group bonded pendant to a carbon at the alpha position of the hydroxyl group.
Dependencies are inferred from the claim text.