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US 10,006,936 B2Granted
Poly(thioaminal) probe based lithography
AssigneeInternational Business Machines Corporation
InventorsDylan J. Boday, Jeannette M. Garcia, James L. Hedrick, Rudy J. Wojtecki
Life of this patent
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Abstract
Methods and materials for patterning a substrate are disclosed herein. A poly(thioaminal) material may be utilized as a thermal resist material for patterning substrates in a thermal scanning probe lithography process. The poly(thioaminal) material may be functionalized with an electron withdrawing group and various monomers may be volatilized upon exposure to a thermal scanning probe.
Claims20
A method of patterning a substrate, comprising:
- forming a poly(thioaminal) material by either (a) ring opening of a hexahydrotriazine with a thiol, or (b) reacting a stabilized imine intermediate with a thiol;
- disposing the poly(thioaminal) material on a substrate;
- and
- patterning the poly(thioaminal) material with a thermal scanning probe.
1 more element
A method of patterning a substrate, comprising:
- forming a poly(thioaminal) material by either (a) ring opening of a hexahydrotriazine with a thiol, or (b) reacting a stabilized imine intermediate with a thiol, the poly(thioaminal) material having a CH2—N(R′)—CH2—S—R—S repeating group, wherein:
- each instance of R is selected from the group consisting of alkyl, aryl, and oligomer, and
- each instance of R′ is an electron withdrawing group selected from the group consisting of CnFn+1, CnFn−1, C6H4X, and heterocyclyl thereof, and wherein X is selected from the group consisting of Br, Cl, NO2 CF3, F, CO2Me CO2H, CN, and combinations thereof;
- disposing the poly(thioaminal) material on a substrate;
- and
- patterning the poly(thioaminal) material with a thermal scanning probe.
3 more elements
A method of patterning a substrate, comprising:
- forming a poly(thioaminal) material by either (a) ring opening of a hexahydrotriazine with a thiol, or (b) reacting a stabilized imine intermediate with a thiol, the poly(thioaminal) material having a S—CH2—NH—R—NH—CH2 repeating group, wherein each instance of R is selected from the group consisting of alkyl, aryl, and oligomer;
- disposing the poly(thioaminal) material on a substrate;
- and
- patterning the poly(thioaminal) material with a thermal scanning probe.
1 more element
Dependencies are inferred from the claim text.