Opaque quartz glass and method for its production
AssigneeTosoh Corporation
InventorsSatori Hirai, Nobusuke Yamada, Kazuyoshi Arai
Life of this patent
Estimating the term…
Abstract
To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.
Claims25
Opaque quartz glass characterized in that the density is at least 1.95 g/cm3 and at most 2.15 g/cm3, the average pore diameter is from 5 to 20 μm, the linear transmittance at a wavelength of from 1.5 μm to 5 μm when the sample thickness is 1 mm, is at most 1%, and the water absorption is at most 0.1 wt %.
Dependencies are inferred from the claim text.